NanoIntegris, a subsidiary of Raymor Industries, recently announced the launch of PureWave Graphene, a substrate-free graphene grown in a plasma reactor, whose specifications are said to approach those of CVD single-layer graphene.
The unique plasma process used to grow PureWave Graphene nanoplatelets is reportedly easy to scale and produces a low cost product. The material contains low oxygen content (1%) and ppm metal impurity levels. The unique growth process based on plasma allows to produce this material at over 100 g/hour. This product is immediately available for research in gram or kg quantities, but lower prices for industrial applications will be unveiled by the end of the year. The company states that PureWave Graphene features a Raman 2D/G ratio close to or greater than unity and a specific surface area (BET) of up to 500 m2/g which is greater than most exfoliated graphenes. This Raman signature is absent from exfoliated GNP, but is displayed by CVD graphene. This and other data proves that PureWave Graphene consists of very few layers (4-7). Furthermore, the turbostratic and wavy morphology of PureWave Graphene leads to an unparalleled ability to be dispersed in a variety of solvents and resins.